Journal: ACS Nano
Article Title: Direct Optical Lithography Enabled Multispectral Colloidal Quantum-Dot Imagers from Ultraviolet to Short-Wave Infrared
doi: 10.1021/acsnano.2c07586
Figure Lengend Snippet: Design and working principle of broad-band multispectral imagers. (a) Device configuration of the multispectral imagers. (b) Schematic illustration of the ligand cross-linking process and the configuration of a UV-enhanced visible pixel and SWIR pixel. (c) Photoluminescence (PL) and absorption spectra of perovskite CsPbX 3 (X = Br, Cl, I) CQDs. (d) Absorption spectra of SWIR and MWIR HgTe CQDs. (e) Optical images of CQD patterns. The scale bars of the images are 5 mm, 100 μm, 100 μm, and 100 μm, respectively.
Article Snippet: A multispectral colloidal quantum-dot imager constructed by patterning PeQDs and HgTe CQDs onto an Si imager extended the sensing ranges of Si-CMOS to the ultraviolet and SWIR (1.1–2.5 μm) and enabled facile discrimination of UV light, visible light, and SWIR.
Techniques: